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Few-layer Phosphorene: An Ideal 2D Material For Tunnel Transistors

机译:少量phosphorene:隧道晶体管的理想2D材料

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摘要

2D transition metal dichalcogenides (TMDs) have attracted a lot of attentionrecently for energy-efficient tunneling-field-effect transistor (TFET)applications due to their excellent gate control resulting from theiratomically thin dimensions. However, most TMDs have bandgaps (Eg) and effectivemasses (m*) outside the optimum range needed for high performance. It is shownhere that the newly discovered 2D material, few-layer phosphorene, has severalproperties ideally suited for TFET applications: 1) direct Eg in the optimumrange ~1.0-0.4 eV, 2) light transport m* (0.15m0), 3) anisotropic m* whichincreases the density of states near the band edges, and 4) a high mobility.These properties combine to provide phosphorene TFET outstanding ION 1 mA/um,ON/OFF ratio~1e6, scalability to 6 nm channel length and 0.2 V supply voltage,thereby significantly outperforming the best TMD-TFETs in energy-delayproducts. Full-band atomistic quantum transport simulations establishphosphorene TFETs as serious candidates for energy-eficient and scalablereplacements of MOSFETs.
机译:2D过渡金属二硫化碳(TMD)由于其极薄的尺寸而具有出色的栅极控制性能,因此在高能效隧穿场效应晶体管(TFET)应用中引起了广泛的关注。但是,大多数TMD的带隙(Eg)和有效质量(m *)超出高性能所需的最佳范围。此处显示的是新发现的2D材料,即多层磷烯,具有几种非常适合TFET应用的特性:1)在约1.0-0.4 eV的最佳范围内进行直接Eg处理; 2)m *(0.15m0)的光传输; 3)各向异性m *会增加能带边缘附近的状态密度,并且4)具有高迁移率,这些特性相结合,可提供出色的IONT离子ION 1 mA / um,ON / OFF比〜1e6,可扩展至6 nm沟道长度和0.2 V电源电压,从而大大优于节能产品中最好的TMD-TFET。全频带原子量子传输模拟将磷光TFET确立为MOSFET的节能和可扩展替代的重要候选者。

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